The POREfessional Deep Retreat Mask

The POREfessional Deep Retreat Mask

Brand:
Benefit Cosmetics
Manufacturer:
LVMH
Country of Origin:
USA
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Quality

Joy

Value for money

Price segment

Description

Time to deep clean! And no, not the kind where you declutter your entire apartment at 2 AM. It’s time to clear out your pores. The POREfessional Deep Retreat gives your skin a super satisfying deep clean by drawing out the excess oil and dirt trapped in your pores—just spot the dots that appear as the mask dries to see it for yourself. Plus, it feels comfortable while you’re wearing it and washes off to reveal visibly refined pores and mattified, refreshed skin. Can cleaning your apartment do that? Didn’t think so.

Ingredients

AQUA (WATER), KAOLIN, SILICA, GLYCERIN, BUTYLENE GLYCOL, PENTYLENE GLYCOL, CI 77007 (ULTRAMARINES), PEG-40 SORBITAN PEROLEATE, SODIUM ACRYLATES COPOLYMER, CAPRYLIC/CAPRIC TRIGLYCERIDE, CI 77499 (IRON OXIDES), HYDROXYACETOPHENONE, LECITHIN, MICA, CHLORPHENESIN, BISABOLOL, CI 77491 (IRON OXIDES), HYDROGENATED VEGETABLE OIL, OPUNTIA COCCINELLIFERA FLOWER EXTRACT, CI 77891 (TITANIUM DIOXIDE), TRISODIUM ETHYLENEDIAMINE DISUCCINATE, SIMMONDSIA CHINENSIS (JOJOBA) SEED OIL, PRUNUS DOMESTICA SEED OIL, PARFUM (FRAGRANCE), DISODIUM PHOSPHATE, POTASSIUM HYDROXIDE, XANTHAN GUM, CRITHMUM MARITIMUM EXTRACT, 1,2-HEXANEDIOL, CAPRYLYL GLYCOL, TOCOPHEROL, CI 77510 (FERRIC FERROCYANIDE), SODIUM PHOSPHATE, SPHINGOLIPIDS, SPHINGOMONAS FERMENT EXTRACT, TOCOPHERYL ACETATE, CITRIC ACID, PENTAERYTHRITYL TETRA-DI-T-BUTYL HYDROXYHYDROCINNAMATE, SODIUM CITRATE

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Ingredients are subject to change at the manufacturer's discretion. For the most complete and up-to-date list of ingredients, refer to the product packaging.

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