Description
Polishing Mask gently eliminates impurities and purifies skin. It leaves skin smoother, cleaner, and visibly more beautiful.
Ingredients
WATER, PARAFFIN, ALCOHOL, MICROCRYSTALLINE CELLULOSE, KAOLIN, PROPANEDIOL, PEG-32, ORYZA SATIVA STARCH (ORYZA SATIVA (RICE) STARCH), PEG-100 STEARATE, GLYCERYL STEARATE, PULLULAN, MAGNESIUM ALUMINUM SILICATE, GLYCERYL CAPRYLATE, BEHENETH-25, CARBOMER, PHENOXYETHANOL, FRAGRANCE, ALLANTOIN, SODIUM HYDROXIDE, TOCOPHEROL, HELIANTHUS ANNUUS SEED OIL (HELIANTHUS ANNUUS (SUNFLOWER) SEED OIL), CITRIC ACID, CI 42090 (BLUE 1), CI 19140 (YELLOW 5)
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Ingredients are subject to change at the manufacturer's discretion. For the most complete and up-to-date list of ingredients, refer to the product packaging.
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