Polishing Mask gently eliminates impurities and purifies skin. It leaves skin smoother, cleaner, and visibly more beautiful.
AQUA, PARAFFIN, ALCOHOL, MICROCRYSTALLINE CELLULOSE, PROPANEDIOL, PEG-32, ORYZA SATIVA STARCH (ORYZA SATIVA (RICE) STARCH), PEG-100 STEARATE, GLYCERYL STEARATE, PULLULAN, MAGNESIUM ALUMINUM SILICATE, GLYCERYL CAPRYLATE, BEHENETH-25, CARBOMER, PHENOXYETHANOL, ALLANTOIN, SODIUM HYDROXIDE, TOCOPHEROL, CITRIC ACID, HELIANTHUS ANNUUS SEED OIL, KAOLIN, CI 19140, CI 42090, PARFUM
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Ingredients are subject to change at the manufacturer's discretion. For the most complete and up-to-date list of ingredients, refer to the product packaging.
23.3% ingredient match
Shared: 12 ingredients
Original only:
PARAFFIN, ALCOHOL, MICROCRYSTALLINE CELLULOSE (+9 more)
Alternative only:
GLYCERIN, CETEARYL ALCOHOL, LUFFA CYLINDRICA FRUIT (+19 more)
23.2% ingredient match
Shared: 11 ingredients
Original only:
PARAFFIN, ALCOHOL, MICROCRYSTALLINE CELLULOSE (+10 more)
Alternative only:
BISABOLOL, BUTYLENE GLYCOL, DICAPRYLYL CARBONATE (+17 more)
20.7% ingredient match
Shared: 9 ingredients
Original only:
PARAFFIN, ALCOHOL, MICROCRYSTALLINE CELLULOSE (+12 more)
Alternative only:
GLYCERIN, PEG-40 HYDROGENATED CASTOR OIL, TRIDECETH-9 (+10 more)
20.4% ingredient match
Shared: 10 ingredients
Original only:
PARAFFIN, ALCOHOL, MICROCRYSTALLINE CELLULOSE (+11 more)
Alternative only:
ILLITE, MONTMORILLONITE, CETYL ALCOHOL (+15 more)
20.3% ingredient match
Shared: 10 ingredients
Original only:
PARAFFIN, ALCOHOL, MICROCRYSTALLINE CELLULOSE (+11 more)
Alternative only:
CETEARYL ALCOHOL, STEARIC ACID, GLYCERIN (+16 more)
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