L64 Anti-mark Serum PHA 14% + Centella Asiatica
Description
Designed to improve the appearance of superficial, healed and shallow scars via PHA's resurfacing and depigmenting effect along with the regenerating power of centella asiatica. Suitable for post acne scarring.
Ingredients
GLUCONOLACTONE, BUTYLENE GLYCOL, PENTYLENE GLYCOL, SODIUM CITRATE, SODIUM HYDROXIDE, CENTELLA ASIATICA LEAF CELL EXTRACT, ASIATICOSIDE, MADECASSIC ACID, GLYCYRRHIZA GLABRA ROOT EXTRACT, GLYCERIN, ASIATIC ACID, CITRIC ACID, XANTHAN GUM, WATER (AQUA /EAU)
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Ingredients are subject to change at the manufacturer's discretion. For the most complete and up-to-date list of ingredients, refer to the product packaging.
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