Balance Mode Pore Polishing Peel-off Mask
Description
A gentle pore-purifying peel-off mask for oily skin. This mask polishes pores and smooths skin texture without stripping; absorbing excess oil for shine‑free skin. Powered by Korean skincare with Rice-inamide Complex (rice water + niacinamide), salicylic acid, and enzyme exfoliants, this formula helps control shine even after the peel‑off!
Ingredients
ORYZA SATIVA (RICE) BRAN WATER, POLYVINYL ALCOHOL, ALCOHOL DENAT., GLYCERIN, BUTYLENE GLYCOL, NIACINAMIDE, WATER / AQUA / EAU, TITANIUM DIOXIDE (CI 77891), PVP, HYDROXYETHYL UREA, ALCOHOL, 1,2-HEXANEDIOL, MICA, SORBITOL, INOSITOL, BENTONITE, AMMONIUM ACRYLOYLDIMETHYLTAURATE/VP COPOLYMER, XANTHAN GUM, SALICYLIC ACID, TROMETHAMINE, DEXTRIN, MALTITOL, SODIUM HYALURONATE, CELLULOSE GUM, ETHYLHEXYLGLYCERIN, HOUTTUYNIA CORDATA EXTRACT, CYCLODEXTRIN, SODIUM GLUCONATE, SQUALANE, MADECASSOSIDE, HYDROLYZED EXTENSIN, TIN OXIDE, PROTEASE, TRYPTOPHAN, THEOBROMA CACAO (COCOA) EXTRACT, MONASCUS/RICE FERMENT, TOCOPHEROL
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Ingredients are subject to change at the manufacturer's discretion. For the most complete and up-to-date list of ingredients, refer to the product packaging.
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